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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Feng, Y.J. Shan, W.L. Jin, M. Zhou, J. Zhou, G.D. Ji, Z.M. Kang, L. Xu, W.W. Yang, S.Z. Wu, P.H. Zhang, Y.H. |
| Copyright Year | 2002 |
| Abstract | Due to the roughness in the surface of the crystal sample, it is hard to use photolithography in the patterning process of the Bi/sub 2/Sr/sub 2/CaCu/sub 2/O/sub 8+/spl delta// intrinsic Josephson junction. In this paper, we report a simple technique for fabricating the Bi/sub 2/Sr/sub 2/CaCu/sub 2/O/sub 8+/spl delta// intrinsic Josephson junctions. In the patterning process, metal masks are used instead of photolithography and argon ion milling is applied to form a small mesa on the Bi/sub 2/Sr/sub 2/CaCu/sub 2/O/sub 8+/spl delta// crystal surface. Real four-probe transport measurements are made on the Bi/sub 2/Sr/sub 2/CaCu/sub 2/O/sub 8+/spl delta// intrinsic junctions and typical current-voltage characteristics with multi-branch structure have been observed, from which the superconducting gap parameter can be extracted. Additionally, from the strung hysteresis in the I-V characteristics, the capacitance C/sub J/ of the unit intrinsic Josephson junction can be estimated, which is in good agreement with that evaluated from the geometric parameters of the unit junction between the two copper oxide lagers. |
| Sponsorship | Council on Superconductivity Appl. Superconductivity Conference Inc MIT |
| Starting Page | 4527 |
| Ending Page | 4529 |
| Page Count | 3 |
| File Size | 320978 |
| File Format | |
| ISSN | 10518223 |
| Volume Number | 9 |
| Issue Number | 2 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1999-06-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Bismuth Strontium Josephson junctions Lithography Rough surfaces Surface roughness Argon Milling Current measurement Current-voltage characteristics |
| Content Type | Text |
| Resource Type | Article |
| Subject | Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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