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Content Provider | IET Digital Library |
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Author | Choi, C. M. Sukegawa, H. Mitani, S. Song, Y. H. |
Abstract | We investigated the stress-induced resistance drift and breakdown characteristics in MgAl2O4 (MAO)-based magnetic tunnel junctions (MTJs) with the MAO thickness of ∼0.9 nm. The occurrence of trap sites around the tunnel barrier–electrode interfaces was characterised via interval voltage stress (IVS) and constant voltage stress (CVS) experiments, in which the occurrence of trap sites affects the resistance drift in IVS and time-dependent dielectric breakdown in CVS. The observed resistance drift ratios were almost the same for positive and negative applied voltages, indicating that the difference in the interface structure was negligibly small between the top and bottom MAO/CoFe interfaces in the MAO-based MTJs. More interestingly, the resistance drift ratios were very low compared with the results of a previous study on MgO-based MTJs. MAO-based MTJs is likely to be an effective alternative that can be used to improve MTJ device reliability. |
Starting Page | 119 |
Ending Page | 121 |
Page Count | 3 |
ISSN | 00135194 |
Volume Number | 53 |
e-ISSN | 1350911X |
Issue Number | Issue 2, Jan (2017) |
Alternate Webpage(s) | https://digital-library.theiet.org/content/journals/el/53/2 |
Alternate Webpage(s) | https://digital-library.theiet.org/content/journals/10.1049/el.2016.3007 |
Journal | Electronics Letters |
Publisher Date | 2016-12-05 |
Access Restriction | Open |
Rights Holder | © The Institution of Engineering and Technology |
Subject Keyword | Cobalt Alloys Constant Voltage Stress Dielectric Breakdown And Space-charge Effects Electric Breakdown Enhanced Magnetoresistance in Magnetic Film And MultiLayer Interface Structure Interfacial Magnetic Property Interval Voltage Stress Iron Alloy Magnesium Compound Magnetic MultiLayer Magnetic Thin Film Magnetic Tunnel Junction Reliability Magnetism in Interface Structure MgAl2O4-CoFe Reliability Solid-solid InterFace Spinel Film Stress-induced Resistance Drift Time-dependent Dielectric Breakdown Trap Site Tunnel Barrier-electrode InterFace Tunnelling Magnetoresistance |
Content Type | Text |
Resource Type | Article |
Subject | Electrical and Electronic Engineering |
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