NDLI: Argon plasma uniformity in a low-pressure inductively coupled plasma source with planar coil

Content Provider	IEEE Xplore Digital Library
Author	Beale, D.F. Kolobov, V.I. Stittsworth, J.A. Hitchon, W.N.G. Wendt, A.E.
Copyright Year	1995
Description	Author affiliation: Eng. Res. Center for Plasma-Aided Manuf., Wisconsin Univ., Madison, WI, USA (Beale, D.F.; Kolobov, V.I.; Stittsworth, J.A.; Hitchon, W.N.G.; Wendt, A.E.)
Abstract	Summary form only given. Plasma uniformity is crucial for material processing applications. We report the results of experimental and theoretical studies of the influence of different factors on uniformity of low pressure Argon plasmas sustained by an RF inductive electric field from a planar coil. Two different experimental studies have been performed. In the first, 2-D spatial profiles of light emission intensity and plasma density were measured in an ICP driven by a 3.5 turn spiral coil placed on the top of a cylindrical plasma volume of radius R=11.5 cm and height L=14 cm. Significant changes in the emission profile were observed as pressure was varied from 10 to 100 mTorr, and power from 100 to 200 Watts. In the second study the effects of aspect ratio (R/L) on plasma density profile were examined in an ICP system with a single-turn circular antenna of radius 14 cm, chamber radius R=17 cm and the pressure range 5-20 mTorr. A shift in plasma density maximum from on-axis to a radial position near the antenna location was observed when L varied from 12 to 2.5 cm. The numerical model contains different modules which solve Maxwell equations for RF inductive field, Poisson equation for space charge density, fluid equations for ion density and Boltzmann equation for electron distribution function (EDF) in the two-term approximation.
File Size	104414
File Format	PDF
ISBN	0780326695
ISSN	07309244
DOI	10.1109/PLASMA.1995.531542
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1995-06-05
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Argon Plasma density Plasma materials processing Plasma applications Plasma measurements Radio frequency Coils Maxwell equations Poisson equations Density measurement
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

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