NDLI: New electron beam proximity effects correction (EBPC) approach for 45nm and 32nm nodes

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2007 Digest of papers Microprocesses and Nanotechnology

Digest of Papers Microprocesses and Nanotechnology 2005

Conference committee

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Table of contents

Digest of papers [title page]

Panasonic's system LSI: towards the ubiquitous network society

Advanced technology development at SEMATECH

Emerging alternative devices for CMOS and beyond

EUV lithography development in the United States

Hyper-NA imaging in ArF immersion lithography

Characterization of 45 nm att-PSM lithography with a hyper-NA ArF tool

Mask enhancer technology on ArF immersion tool for 45nm-node CMOS with 0.249/spl mu/m/sup 2/ SRAM contact layer fabrication

Resist LER and LWR transfer during plasma etching processes for node 45 nm and beyond

Model-based OPC for resist reflow process

Newly developed RELACS process and materials for 65nm node device and beyond

Nanofabrication of inorganic structures utilizing biotechnology

Highly ordered horizontally directional SWNTs grown by thermal CVD with a local electric field

Nanocomposites of carbon nanotubes-gold nanoparticles for surface-enhanced Raman scattering

Position-controlled carbon nanotube growth on single iron nanoparticles prepared by electron beam-induced chemical vapor deposition

Carbon nanotube composites for electrochemical sensing

Formation factors of watermark for immersion lithography

Low k/sub 1/ contact hole formation by double L&S formation method with contact hole mask and dipole illumination

Improved image resolution for wafer inspection tool using sub-200 nm wavelength (DUV light) light optical system

Reticle haze measurement by spectroscopic ellipsometry

Nano-mechanical analysis through manipulating protein molecules with AFM

Potential response of genetic field effect transistor to charged nanoparticle-DNA conjugate

On-chip single-cell-based gene expression analysis using gold nano-particles

Novel characteristics of multifunctional fluid filter fabricated by high energy SR lithography

Improved passive cell distributing method to micro cellular diagnostic well array

On-chip electrophoresis system as a tool for studying cell-cycle dependent properties

Progress in ArF immersion lithography

Defect control of immersion lithography with top coat material

Synthesis of fluorinated materials for 193-nm lithography

Nano-scale fabrication and nano-scale interface control for molecular/organic devices

Artificial dislocation network for Si nanodevices

Formation of nanostructures by selective-area MOVPE and their applications

Side-wall measurement using tilt-scanning method in atomic force microscope

Epoxy-containing ArF resists with narrow molecular weight distribution

Molecular resists based on cholate derivatives for electron-beam lithography

Effect of low surface tension liquid on pattern collapse analyzed by dynamical meniscus observation

In-situ monitoring of iron nanoparticles movement and graphitization control by Joule heating at local current injection

Buckling of carbon nanotubes under axial compression

Nano-structured surface fabrication for higher luminescent LED by self-assembled block copolymer

Tuning photonic bandgap of 3D opal structures by utilizing polymer and silica hybrid colloids

Sensitivity-limiting factors of at-wavelength EUVL mask blank inspection

Phase defect observation using an EUV microscope

Aerial image characteristics of modified absorber model for extreme ultraviolet lithography (EUVL)

3D rigorous simulation of EUV defective masks using modal method by Fourier expansion

Suppression of reflectance drop of Ru-capped multilayer mirror by irradiation atmosphere

"Super Growth" - highly efficient synthesis of impurity-free single-walled carbon nanotubes and its application

Low pressure CVD growth of single-wall carbon nanotubes

Characterization and evaluation of ALD-HfO/sub 2/ using H/sub 2/O and D/sub 2/O as an oxidant

Synthesis and characterization of nano honeycomb TiO/sub 2/ electrodes

Soft X-ray emission and absorption spectra of DLC film formed by FIB-CVD method

A simulation of backscattered electron microtomography in scanning electron microscope

Development of nm resolution focus detector in vacuum for EUVM

A new EUV irradiation and multilayer evaluation system for EUVL mirror contamination in NewSUBARU

Wafer level vertical interconnection method for microcolumn array

CD engagement of critical parameters in chemically amplified resists process and advanced mask lithography using 50keV electron beam

Electron beam lithography using inorganic resist at low acceleration voltage

Dependence of acid yield on resist thickness in chemically amplified electron beam resist

Low Ea chemical amplification resists for 193nm lithography

Organic monolayers covalently bonded to Si as ultra thin photoresist films in vacuum ultra-violet lithography

Non-contacting deformation of isolated resist pattern due to interaction force analyzed by atomic force microscope

Emission characteristics of silicon field emitter arrays as space charge and wafer charging neutralizer in ion implanter

Repairing of etching-induced damage of high-k Ba/sub 0.5/Sr/sub 0.5/TiO/sub 3/ thin films by oxygen surface plasma treatment

Enhancement of electrical property and thermal stability of (Ba,Sr)TiO/sub 3/ thin films on Cu(Mg) bottom electrodes

Electrical switching studies of Ge/sub 1/Se/sub 1/Te/sub 2/ thin film for phase change memory

Device optimization of multiple-channel FET with 2D Poisson-Schrodinger solver

3D topography simulation for structural analysis in nanometer semiconductor process

Characterization of argon fast atom beam source and its application to the fabrication of resonant tunneling diodes

Electrical characterization of GaAs/AlGaAs multi-quantum wells for quantum cascade laser

Effect of fabrication process on hysteresis of carbon nanotube FETs

Process dependent output characteristics of resonant cavity type avalanche photodetector

Fabrication of three-dimensional HSQ resist structure using electron beam lithography

Nano-ablation of inorganic materials using laser plasma soft X-rays at around 10 nm

Combination of electron beam recorders and imprint lithography for realisation of patterned media and next generation optical media

Observation of a sputtered Si surface irradiated by metal cluster complex ions

A novel nanofabrication technique for the array of nanogap electrodes

Fabrication of nanosize aperture under electron beam exposure for optical trapping device

Comparison of trimming techniques for sub-lithographic silicon structures

On proximity effect in electron beam induced deposition

Dynamic growth process of W-nano-branched structure on insulator substrate studied with transmission electron microscopy

Resistivity measurements of nanorods formed by electron beam-induced deposition

Electrical transport in high-temperature region of nanowiring grown by focused-ion-beam chemical vapor deposition

Structure analysis of self-assembled ErSi/sub 2/ nanowires formed on Si substrates

In situ generation and growth behavior of alpha-Fe nanocrystals by electron beam induced deposition using iron pentacarbonyl

The possibility to fabricate supertip at the bottom surface of thin film using high-energy electrons

High-performance and damage-free magnetic film etching using pulse-time-modulated Cl/sub 2/ plasma

Crystallization of focused-electron-beam deposited tungsten wire on molybdenum substrate

Surface modification of DLC films by synchrotron radiation exposure under the perfluorohexane gas atmosphere

Electrical properties of multi-walled carbon nanotubes prepared by MPCVD

Carbon protrusions fabricated from PTFE

Carbon nanostructures formation by electron beam induced deposition at the apex of tungsten needle tip

Characterization of nanofloating gate memory with ZnO nanoparticles embedded in polymeric matrix

Effect of rutile-type content on optical absorption and photoelectrochemical properties of nanostructured anatase-type TiO/sub 2/ electrodes sensitized with CdSe quantum dots

Optical absorption, photoelectrochemical, and ultrafast carrier dynamic investigations of CdSe quantum dot sensitized TiO/sub 2/ electrodes composed of nanotubes and nanowires

Various morphological changes of PTFE and EPTFE surfaces induced by ion beam irradiation

Monitoring self-assembly processes by characterizing optical properties of gold nanoparticles

Electronic and structural characteristics of atomic diffusion in Fe/Al [001] and Al/Fe [001] systems

Electronic structure and magnetic property of Mn adsorbed /spl beta/-SiC(100)

Electrical properties of InAs/InGaAs/GaAs quantum-dot infrared photodetectors

Amorphous carbon assisted highly percentage synthesis of ultralong, well-aligned, and visible carbon nanotubes

Si etching with high aspect ratio and smooth side profile for mold fabrication

In-situ monitoring of cavity filling in nanoimprint by capacitance

UV-based nanoimprint lithography for photosensitive dry film

Direct formation of homogeneous DNA-probe surface on polyimide thin film by vapor deposition polymerization

Fabricaton of PDMS microlens for LIF detection

Contractile force measurement of cardiomyocytes using a hybrid biopolymer microcantilever array

Ultrasensitive detection of nanoparticle-based bio bar-code DNA sensor by using nano-gap electrodes

Laterally-driven RF microswitch with high isolation

Fabrication of a three-dimensional multichamber using polymer bonding and MEMS technology

Design and fabrication of a MEMS-based electrolytic tilt sensor

Generation of air microplasma jet and its application to the local etching of polyimide films

Structural and emission characteristics of iron-oxide whiskers on a steel plate

Electromagnetic induction phenomena of nano-coil fabricated by FIB-CVD

Development of simultaneous image acquisition optics with transmitted and reflected light for 45nm (hp) node mask inspection

Graphitic tube formation by flush discharge with Ga observed in amorphous carbon pillar

A new fabrication technology of FinFETs using a neutral beam etching

Optimization of sub-wavelength texturing structures in solar cells by utilizing modified illumination and defocus techniques in optical lithography

Potential distribution in resistivity measurement for nanorods formed by electron beam induced deposition

Comparison of Young's modulus dependency on beam accelerating voltage between EB- and FIB-CVD pillars

MCC system with CP

Application of EPL to via formation in two-layer metallization

E-beam data preparation method for forming ultra fine curved patterns in silicon microphotonic circuit

New electron beam proximity effects correction (EBPC) approach for 45nm and 32nm nodes

Fabrication of self-organized nanopatterns by angle-controlled ion sputtering

In-plane ordering of self-assembled InAs quantum dots on GaAsSb/GaAs(001) layers by molecular beam epitaxy

Fabrication of carbon nanowalls using novel plasma processing

Fabrication of nano-structured optical devices using nanoimprint lithography

Fabrication of multi-layered structure by advanced reversal imprints lithography

Double mold imprinting of micro fluidic device with ultra-thin PDMS window for in-vitro X-ray microscopy observation

Photo-nanoimprinting using SOFT (sample on flexible thruster) stage

New developments in S-FIL technology

Three-terminal ballistic junctions: new building blocks for functional devices in nanoelectronics

Analysis of backscattering phenomenon from drain region in a silicon nanodiode

Comparative study on effective electron mobility in FinFETs with a (111) channel surface fabricated by wet and dry etching processes

SoxFET: three-dimensional selective oxidation channel MOSFET

Electrical conduction in 10 nm-thin polysilicon wires from 4K to 400K and their operation for hybrid memory

All plastic microfluidic device with built-in 3-D fine microstructures

Low-voltage high-isolation RF MEMS switch based on a single crystalline silicon structure with fine gap vertical comb

Two-stage-driven cantilever-based RF MEMS micro-switch

Electrodeposition of organic dielectric and its application to MEMS devices

Fabrication of a gated cold cathode by using the inkjet embedding method

Gate controlled electrostatic droplet ejection

Manipulation using 3-D nano-manipulator fabricated by FIB-CVP in the nano-factory

Fabrication of antigen sensor using carbon nanotube FETs

Electron transport of single-wall carbon nanotube quantum-dots under the THz laser irradiation

Fabrication of CNT-FETs using PECVD-grown nanotubes

DC and radio-frequency transport characteristics of lambda deoxyribonucleic acid molecules

Digest of Papers. 2004 International Microprocesses and Nanotechnology Conference, 2004.

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Digest of Papers. Microprocesses and Nanotechnology 2001. 2001 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.01EX468)

Digest of Papers Microprocesses and Nanotechnology 2000. 2000 International Microprocesses and Nanotechnology Conference (IEEE Cat. No.00EX387)

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Digest of Papers. Microprocesses and Nanotechnology'98. 198 International Microprocesses and Nanotechnology Conference (Cat. No.98EX135)

New electron beam proximity effects correction (EBPC) approach for 45nm and 32nm nodes

Content Provider	IEEE Xplore Digital Library
Author	Manakli, S. Docherty, K. Pain, L. Todeschini, J. Jurdit, M. Icard, B. Leseuil, S. Minghetti, B.
Copyright Year	2005
Description	Author affiliation: STMicroelectron., Crolles, France (Manakli, S.; Docherty, K.)
Abstract	Summary form only given. After the last successful results obtained these last years, EBDW (E-beam direct write) use for ASIC manufacturing is now demonstrated. However, throughput and resolution capabilities need to be improved to push its interest for fast cycle product and advanced R&D applications. In this way, the development of the process needs a good dimensional control of patterns. That means a better control of the proximity effects affected by the back scattering electrons and others phenomenon. There exist several methods to provide a correction for these effects and the most commonly used is that of dose adjustment as implemented by PDF solutions PROXECCO software package. However it has been observed that this correction is not perfect and significantly it fails to accurately correct the smallest and most dense structures encountered in designs with features below 65nm. To continue reducing feature sizes a method to provide a complementary correction to PROXECCO has been proposed. Based upon detailed characterization of the observed effects a rules correction scheme has been developed not dissimilar to the rule based corrections used in optical proximity correction (OPC). This electron beam proximity correction, or EBPC, has been shown to provide good results down to 40nm, with improvements in CD linearity, the isolated dense bias (IDB), line end shortening (LES), mask error enhancement factor (MEEF) and the energy latitude (EL) all of which leads to an improvement in the overall accuracy of the design, and furthermore an improvement in the process window.
Sponsorship	Japan Soc. of Appl. Phys
File Size	792291
File Format	PDF
ISBN	4990247221
DOI	10.1109/IMNC.2005.203828
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-10-25
Publisher Place	Japan
Access Restriction	Subscribed
Rights Holder	Japan Soc. of Applied Physics
Subject Keyword	Electron beams Proximity effect Optical scattering Application specific integrated circuits Manufacturing Throughput Research and development Software packages Electron optics Linearity E-Beam Proximity correction (EBPC) electron beam process improvement PROXECCO RET OPC
Content Type	Text
Resource Type	Article

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