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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Nakamatsu, K. Tone, K. Matsui, S. |
| Copyright Year | 2005 |
| Description | Author affiliation: Graduate Sch. of Sci., Hyogo Univ., Japan (Nakamatsu, K.) |
| Abstract | This paper proposes for the first time the UV-based NIL for commercially available planarized photosensitive dry film (Photec RY-3300 series, Hitach chemical Ltd.) on base sheet. The photosensitive dry film was formed by laminating method using laminating tool, as alternative to spin-coating process in use of liquid solution. The temperature and pressure for the laminating process were 110/spl deg/C and 0.4 MPa, respectively. The rapid laminating speed of 1.5 m/min was used. The laminating method offered homogeneous dry resin that is needed to perform uniform imprinting. As another benefit, the dry film can be uniformly formed on various base film or substrate in large area. Result indicates that the photosensitive dry film formed by laminating method would be applied as the replication material for UV-based NIL process. |
| Sponsorship | Japan Soc. of Appl. Phys |
| Starting Page | 202 |
| Ending Page | 203 |
| File Size | 582902 |
| Page Count | 2 |
| File Format | |
| ISBN | 4990247221 |
| DOI | 10.1109/IMNC.2005.203808 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2005-10-25 |
| Publisher Place | Japan |
| Access Restriction | Subscribed |
| Rights Holder | Japan Soc. of Applied Physics |
| Subject Keyword | Nanolithography Throughput Fabrication Nanostructured materials Costs Viscosity Planarization Temperature Resins Substrates |
| Content Type | Text |
| Resource Type | Article |
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