NDLI: Newly developed RELACS process and materials for 65nm node device and beyond

Content Provider	IEEE Xplore Digital Library
Author	Terai, M. Kumada, T. Ishibashi, T. Hanawa, T.
Copyright Year	2005
Description	Author affiliation: Mitsubishi Electr. Corp, Hyogo, Japan (Terai, M.; Kumada, T.)
Abstract	To meet market's demands for high performance devices, we have studied various resolution enhancement techniques (RET), such as off axis illumination, phase shift masks, optical proximity correction, resist thermal reflow, and chemical shrinkage process etc. RELACS (resolution enhancement lithography assisted by chemical shrink) is one of the most useful technology among chemical shrink processes. We have introduced KrF-RELACS process into mass production phase. However, in the case of ArF lithography, we are not able to be satisfied with shrinkage performance of conventional RELACS materials. To improve this matter, we paid attention to the chemically difference of side chain between KrF resist and ArF resist polymers.
Sponsorship	Japan Soc. of Appl. Phys
Starting Page	20
Ending Page	21
File Size	1156554
Page Count	2
File Format	PDF
ISBN	4990247221
DOI	10.1109/IMNC.2005.203717
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-10-25
Publisher Place	Japan
Access Restriction	Subscribed
Rights Holder	Japan Soc. of Applied Physics
Subject Keyword	Resists Chemical processes Chemical technology Lithography Optical materials Lighting Optical devices Thermal resistance Mass production Polymers
Content Type	Text
Resource Type	Article

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
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4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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Newly developed RELACS process and materials for 65nm node device and beyond