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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Pawel, I. Siemieniec, R. Rosch, M. |
| Copyright Year | 2008 |
| Description | Author affiliation: Infineon Technol. Austria AG, Villach (Pawel, I.; Siemieniec, R.; Rosch, M.) |
| Abstract | In this paper, we describe the crucial dependence of avalanche behavior on epitaxial layer thickness and gate resistance during undamped inductive switching (TJIS) especially for high currents for power MOSFET devices employing field-plate compensation in the drift region. All transient simulations were performed using Medici's mixed-mode simulation approach including self-heating. A higher epitaxial layer thickness eventually resulted in a higher avalanche ruggedness but also in higher on-state resistance. Thus, a trade-off exists. |
| Starting Page | 163 |
| Ending Page | 166 |
| File Size | 264123 |
| Page Count | 4 |
| File Format | |
| ISBN | 9781424418817 |
| DOI | 10.1109/ICMEL.2008.4559248 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2008-05-11 |
| Publisher Place | Serbia & Montenegro |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | MOSFETs Voltage Epitaxial layers Immune system Medical simulation Inductance Resistors Pulse measurements Silicon Region 2 |
| Content Type | Text |
| Resource Type | Article |
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