NDLI: The Patterning of Electric Circuits by Mask-Deposition Technology

Content Provider	IEEE Xplore Digital Library
Author	Yotsuya, S. Makigaki, T.
Copyright Year	2006
Description	Author affiliation: Production Engineering & Development Div., SEIKO EPSON Corporation, Japan (Yotsuya, S.)
Abstract	We dev eloped the dep osition-mask to apply MEMS techn olog y and the mask-de positio n technology to pattern fine precise electric circuits. As the mask was fabricated to from a dry-et ching proc ess using the De ep-Si-RIE and a wet-etching pro cess, this mask can pattern fine precision electric circuits. We also dev eloped ma sk contact tech nolo gy that maintains go od co ntact betw een the mask and the substrate. The tech nolo gy is such a that magn etic layer is dep osited on the mask surface by using electroless-plating, and achieves go od adh esion for inserting the substrate between this mask an d the rub ber she et magn et. Th ese techn ologies sh ow that the fine precise electric circuits of 28 µ m lines and 18 µ m spaces can be consta ntly achieved. In addition, this electric-pattern is continu al and is not disrupted by the shade of the beam that reinforc es the mask.
Starting Page	294
Ending Page	297
File Size	672185
Page Count	4
File Format	PDF
ISBN	0780394755
ISSN	10846999
DOI	10.1109/MEMSYS.2006.1627794
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2006-01-22
Publisher Place	Turkey
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Circuits Etching Resists Lithography Watches Fabrication Oxidation Production engineering Product development Silicon
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics Electronic, Optical and Magnetic Materials Mechanical Engineering Electrical and Electronic Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Single-mask reduced-gap capacitive micromachined devices

Silicon nanophotonic wire structures fabricated by 193nm optical lithography

A new paradigm for high resolution 3D lithography

Etching and lithography running neck and neck

A single-mask process for 3-D microstructure fabrication in glass and elastomers

Microwave operation of submicrometer channel-length Silicon MOSFET's

Fabrication of 3D microstructures with inclined/rotated UV lithography

A novel global planarization technology using defocused resist patterning with blanket stripe mask (DRESS)

One mask nickel micro-fabricated reed relay

The Patterning of Electric Circuits by Mask-Deposition Technology

Similar Documents

Single-mask reduced-gap capacitive micromachined devices

Silicon nanophotonic wire structures fabricated by 193nm optical lithography

A new paradigm for high resolution 3D lithography

Etching and lithography running neck and neck

A single-mask process for 3-D microstructure fabrication in glass and elastomers

Microwave operation of submicrometer channel-length Silicon MOSFET's

Fabrication of 3D microstructures with inclined/rotated UV lithography

A novel global planarization technology using defocused resist patterning with blanket stripe mask (DRESS)

One mask nickel micro-fabricated reed relay

The Patterning of Electric Circuits by Mask-Deposition Technology