NDLI: Improvement of fT in InAl(Ga)N barrier HEMTs by plasma treatments

Content Provider	IEEE Xplore Digital Library
Author	Ronghua Wang Guowang Li Tian Fang Laboutin, O. Yu Cao Johnson, W. Snider, G. Fay, P. Jena, D. Huili Xing
Copyright Year	2011
Description	Author affiliation: Kopin Corporation, Tauton, MA 02780, USA (Laboutin, O.; Yu Cao; Johnson, W.) \|\| Department of Electrical Engineering, University of Notre Dame, IN 46556, USA (Ronghua Wang; Guowang Li; Tian Fang; Snider, G.; Fay, P.; Jena, D.; Huili Xing)
Abstract	GaN-based high electron mobility transistors (HEMTs) have been developed for high-temperature, high-frequency and high-power applications. To improve the transistor speed, various techniques have been explored in addition to scaling down the gate length and top barrier thickness: ultrathin SiN passivation to reduce access resistance and parasitic capacitances [1]; re-grown ohmic contacts and self-alignment to minimize access resistances [2, 3]; O2 plasma treatment in the gate region prior to the metal deposition to suppress rf transconductance collapse [4]; and dielectric-free passivation (DFP) by a O2-containing plasma treatment in the access region to shorten the gate extension in InAlN HEMTs [5]. Here we report a comparative study on the impact of various plasma treatments in the access region (DFP) as well as under the gate for InAl(Ga)N barrier HEMTs, and propose a model for the observed fT improvement.
Starting Page	139
Ending Page	140
File Size	703478
Page Count	2
File Format	PDF
ISBN	9781612842431
ISSN	15483770
e-ISBN	9781612842448
e-ISBN	9781612842424
DOI	10.1109/DRC.2011.5994455
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2011-06-20
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Gallium nitride Electron traps Silicon carbide
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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Trapping effects in wide-bandgap microwave FETs

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Improvement of fT in InAl(Ga)N barrier HEMTs by plasma treatments

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