NDLI: Improved ion implant exhaust management for reduced energy and capital costs

Content Provider	IEEE Xplore Digital Library
Author	Sweeney, J. Olander, K. Ballance, S.
Copyright Year	2015
Description	Author affiliation: Electron. Mater. Entegris, Inc., Danbury, CT, USA (Sweeney, J.; Olander, K.) \|\| Worldwide Facilities, Texas Instrum., Inc., Dallas, TX, USA (Ballance, S.)
Abstract	Climate change, as a consequence of increased greenhouse gas emissions, is a growing concern. Reducing energy usage in semiconductor manufacturing is an effective way to be responsive to this global issue and reduce costs. Compared to other manufacturing tools in the fab, ion implanters require the largest exhaust volume, typically using 2500 CFM in total ventilation, split between the gas box and the containment shell enclosure. Considering a fab may contain 30+ implanters, the energy needed to replace this volume of clean, highly conditioned air is substantial and requires large infrastructure expenditures. In 2009, Texas Instruments published a methodology to save both variable and capital costs by reusing about 75% of the exhausted air volume associated with operating the implanters in one of their 300 mm fabs. This article examines the energy savings, avoided capital spending and safety of operation associated with this change. Building on TI's advances, this article also proposes ways to further reduce exhaust requirements and integrate ventilation management into the operating architecture of the ion implanter to produce a smart system capable of operating at or below 95% of historical levels and at an even higher level of safety.
Starting Page	169
Ending Page	172
File Size	224307
Page Count	4
File Format	PDF
ISBN	9781479999309
DOI	10.1109/ASMC.2015.7164463
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2015-05-03
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Implants Valves Safety Gases Exhaust systems Manifolds Manuals
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
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9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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