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Crystal growth of device quality gaas in space (Document No: 19810013401)
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Author | Lagowski, J. |
| Copyright Year | 1981 |
| Description | Experimental and theoretical efforts in the development of crystal growth approaches, effective techniques for electronic characterization on a macro and microscale, and in the discovery of phenomena and processes relevant to GaAs device applications are reported. The growth of electron trap-free bulk GaAS with extremely low density of dislocations is described. In electroepitaxy, growth configuration which eliminates the substrate back-contact was developed. This configuration can be extended to the simultaneous growth on many substrates with a thin solution layer sandwiched between any two of them. The significant reduction of Joule heating effects in the configuration made it possible to realize the in situ measurement of the layer thickness and the growth velocity. Utilizing the advantages of electroepitaxy in achieving abrupt acceleration (or deceleration) of the growth it was shown that recombination centers are formed as a result of growth acceleration. |
| File Size | 1979925 |
| Page Count | 40 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19810013401 |
| Archival Resource Key | ark:/13960/t8nd0s89g |
| Language | English |
| Publisher Date | 1981-04-01 |
| Access Restriction | Open |
| Subject Keyword | Solid-state Physics In Situ Measurement Gallium Arsenides Electrical Properties Electroepitaxy Solid-solid Interfaces Cathodoluminescence Liquid Phase Epitaxy Semiconductors Materials Melts Crystal Growth Space Commercialization Oxide Films Space Processing Indium Phosphates Ntrs Nasa Technical Reports ServerĀ (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Technical Report |