NDLI: Automatic Cell Layout in the 7nm Era

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Automatic Cell Layout in the 7nm Era

Content Provider	ACM Digital Library
Author	Schneider, Jan Silvanus, Jannik Cremer, Pascal Hougardy, Stefan
Abstract	Multi patterning technology used in 7nm technology and beyond imposes more and more complex design rules on the layout of cells. The often non local nature of these new design rules is a great challenge not only for human designers but also for existing algorithms. We present a new flow for the automatic cell layout that is able to deal with these challenges by globally optimizing several design objectives simultaneously. Our transistor placement algorithm not only minimizes the total cell area but simultaneously optimizes the routability of the cell and finds a best folding of the transistors. Our routing engine computes a detailed routing of all nets simultaneously. In a first step it computes an electrically correct routing using a mixed integer programming formulation. To improve yield and optimize DFM, additional constraints are added to this model. We present experimental results on current 7nm designs. Our approach allows to compute optimized layouts within a few minutes, even for large complex cells. Our algorithms are currently used for the design of 7nm cells at a leading chip manufacturer where they improved manufacturability and led to reduced turnaround times.
Starting Page	99
Ending Page	106
Page Count	8
File Format	PDF
ISBN	9781450346962
DOI	10.1145/3036669.3036672
Language	English
Publisher	Association for Computing Machinery (ACM)
Publisher Date	2017-03-19
Publisher Place	New York
Access Restriction	Subscribed
Subject Keyword	Multiple patterning lithography 7nm Design for manufacturing Automated cell generation 2d layout Cell design
Content Type	Text
Resource Type	Article

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