NDLI: Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography

Content Provider	ACM Digital Library
Author	Luk-Pat, Gerard Song, Hua Shiely, James Wong, Martin D. F. Du, Yuelin Ma, Qiang Miloslavsky, Alexander
Abstract	Self-aligned double patterning (SADP) lithography is a leading technology for 10nm node Metal layer fabrication. In order to achieve successful decomposition, SADP-compliant design becomes a necessity. Spacer-Is-Dielectric (SID) is the most popular flavor of SADP with higher flexibility in design. This paper makes a careful study on the challenges for SID-compliant detailed routing and proposes a graph model to capture the decomposition violations and SID intrinsic residue issues. Then a negotiated congestion based scheme is adopted to solve the overall routing problem. The proposed SID-compliant detailed routing algorithm simultaneously assigns colors to the routed wires, which provides valuable information guiding SID decomposition. In addition, if one pin has multiple candidate locations, the optimal one will be automatically determined during detailed routing. The decomposability of the conflict-free routing layers produced by our detailed router is verified by a commercial SADP decomposition tool.
Starting Page	1
Ending Page	6
Page Count	6
File Format	PDF
ISBN	9781450320719
DOI	10.1145/2463209.2488848
Language	English
Publisher	Association for Computing Machinery (ACM)
Publisher Date	2013-05-29
Publisher Place	New York
Access Restriction	Subscribed
Subject Keyword	Sid-compliant detailed routing Sadp
Content Type	Text
Resource Type	Article

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Spacer-is-dielectric-compliant detailed routing for self-aligned double patterning lithography