NDLI: Fabrication of sub-wavelength structures on silicon dioxide

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The Journal of Engineering

Fabrication of sub-wavelength structures on silicon dioxide

Content Provider	IET Digital Library
Author	Huang, Mao Jung Tang, Yu Hsiang Su, Jien Yin Chu, Nien Nan Shiao, Ming Hua Hsiao, Chien Nan
Abstract	In this reported work, nanosphere lithography (NSL) and inductively coupled plasma reactive ion etching (ICP-RIE) are combined to successfully fabricate a sub-wavelength structure (SWS) on a glass substrate, achieving broadband antireflection and increasing the transmittance of incident light through the glass. The experimental results show that the SWS surfaces with 180 nm width and 50 nm height could be fabricated onto glass. The mean reflectance of a blank glass is 5.81% in the wavelength range of 400–950 nm, 3 min of ICP-RIE combined with NSL reduce the mean reflectance to 3.5% and increases the mean transmittance from 92.3 to 94.3%. An additional coat of a 200 Å-thick gold layer on the 30 s etched surface sample reduces the transmittance in the visible light range (400–700 nm) to 36.6%, which is 2.25 times larger than that at the infrared range (700–950 nm). The proposed novel fabrication technology has the advantage of being low cost, and the fabricated nanodot array structure, which is gold coated, can be used on an insulated window.
Starting Page	637
Ending Page	640
Page Count	4
Volume Number	8
e-ISSN	17500443
Issue Number	Issue 10, Oct (2013)
Alternate Webpage(s)	https://digital-library.theiet.org/content/journals/mnl/8/10
Alternate Webpage(s)	https://digital-library.theiet.org/content/journals/10.1049/mnl.2013.0289
Journal	Micro & Nano Letters
Access Restriction	Open
Rights Holder	© The Institution of Engineering and Technology
Subject Keyword	Alloys Antireflection Coatings Blank Glass Broadband Antireflection Etched Surface Fabrication Technology Glass Substrate Gold Gold Layer Incident Light Transmittance Inductively Coupled Plasma Reactive Ion Etching Infrared And Raman Spectra in Metals Infrared Spectra Insulated Window Mean Reflectance Mean Transmittance Nanodot Array Structure Nanofabrication Nanolithography NanoParticle Nanosphere Lithography Nanostructured Material Nanotube And Nanostructured Material Optical Coatings Optical Property of Metals And Metallic Alloy Plasma Application in Manufacturing And Material Processing Semimetals Silicon Dioxide SiO2 Size 180 Nm Size 200 A Size 50 Nm Sputter Etching Structure of Solid Clusters Subwavelength Structure Fabrication Subwavelength Structure SurFace Surface Treatment And Degradation of Metals And Alloy Time 3 Min Time 30 S Visible And Ultraviolet Spectra of Metals Visible Light Visible Spectra Wavelength 400 Nm to 950 Nm
Content Type	Text
Resource Type	Article

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