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Content Provider | IET Digital Library |
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Author | Tian, Li Li, Ling Wu, Min |
Abstract | Nano-textured anti-reflection (AR) films are designed elaborately to improve the transmittance character and to reduce the surface reflection loss. This work reports the gradient-index titanium dioxide (TiO2) AR coatings (ARCs) with the thickness of 50–400 nm, which was deposited by radio-frequency magnetron sputtering-assisted with the oblique-angle deposition technique on the low-iron glass substrates. The technological parameters related with this deposition were discussed such as the base pressure and target–substrate distance, as well as the vapour incident angle. Then, optical characteristics of the graded-index coating were discussed. An ellipsometric model was built to account for the structural and optical differences. The optimal thickness of the TiO2 ARC was about 250 nm. It exhibited a higher transmittance at the visible light regions over a large wavelength range than that of the primitive glass substrate. The value of refractive index for the TiO2 ARC was 2.245 at the wavelength of 632.8 nm. |
Starting Page | 849 |
Ending Page | 853 |
Page Count | 5 |
Volume Number | 12 |
e-ISSN | 17500443 |
Issue Number | Issue 11, Nov (2017) |
Alternate Webpage(s) | https://digital-library.theiet.org/content/journals/mnl/12/11 |
Alternate Webpage(s) | https://digital-library.theiet.org/content/journals/10.1049/mnl.2017.0408 |
Journal | Micro & Nano Letters |
Publisher Date | 2017-11-01 |
Access Restriction | Open |
Rights Holder | © The Institution of Engineering and Technology |
Subject Keyword | Antireflection Coatings Condensed Matter Deposition by Sputtering Ellipsometric Model Ellipsometry Epitaxy Gradient Index Optics Gradient-index Titanium Dioxide Antireflection Coatings Inorganic SemiConductor And Insulator Low-iron Glass Substrates Nanofabrication Nanometre-Scale Semiconductor Fabrication Technology NanoParticle Nanostructured Material Nanotextured Antireflection Film Nanotube And Nanostructured Material Oblique-angle Deposition Technique Optical Characteristic Optical Coatings Optical Coatings And Filter Optical Constants And Parameter Optical Property Oxide And Ferrite SemiConductor Radiofrequency Magnetron Sputtering Refractive Index Semiconductor Growth Semiconductor Thin Film Size 50 Nm to 400 Nm Sputter Deposition Structural Property Structure Structure of Solid Clusters Surface Reflection Loss Texture Thin Film Growth TiO2 Titanium Compound Transmittance Character Wide Band Gap SemiConductor |
Content Type | Text |
Resource Type | Article |
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