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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Furui, Y. Miura-Mattausch, M. Sadachika, N. Miyake, M. Ezaki, T. mattausch, H.J. Ohguro, T. Iizuka, T. Inagaki, R. Fudanuki, N. |
| Copyright Year | 2007 |
| Description | Author affiliation: Hiroshima Univ., Hiroshima (Furui, Y.; Miura-Mattausch, M.; Sadachika, N.; Miyake, M.; Ezaki, T.) |
| Abstract | STARC (Semiconductor Technology Academic Research Center) is a research consortium co-founded by major Japanese semiconductor companies, whose mission is to contribute to the growth of the Japanese semiconductor industry by developing leading-edge SoC design technologies. One of the achievements enabled by the academia collaboration is HiSIM (Hiroshima University STARC IGFET Model) an advanced MOSFET Model. The HiSIM2 version includes required features in modeling for the 45 nm technology node and beyond such as the STI effect. A major development is an improved model consistency, which enables even modeling of the technology variation accurately. HiSIM2 realizes both accurate and fast circuit simulation. |
| Starting Page | 41 |
| Ending Page | 46 |
| File Size | 770452 |
| Page Count | 6 |
| File Format | |
| ISBN | 8392263243 |
| DOI | 10.1109/MIXDES.2007.4286118 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2007-06-21 |
| Publisher Place | Poland |
| Access Restriction | Subscribed |
| Rights Holder | Tech Univ of Lodz Dept of Microelectronics & Computer Science |
| Subject Keyword | Circuit simulation Companies Calculation speed Lead compounds Analog & RF application Radio frequency STARC Consortium Electronics industry Collaboration MOSFET circuits Silicon Consumer electronics MOSFET model Surface potential Testing |
| Content Type | Text |
| Resource Type | Article |
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