NDLI: SU-8 as an electron beam lithography resist

Content Provider	IEEE Xplore Digital Library
Author	Williamson, F. Shields, E.A.
Copyright Year	2003
Description	Author affiliation: Microtechnol. Lab., Minnesota Univ., Minneapolis, MN, USA (Williamson, F.)
Abstract	SU-8 resist is an epoxy resin dissolved with a photoinitiator in an organic solvent. The result is a negative resist originally developed for high aspect ratio MEMS applications. For some applications SU-8 has several advantages over the most commonly used e-beam resist, PMMA, which include a much higher sensitivity and increased chemical and mechanical robustness. We have used our Raith 150 electron beam lithography tool to investigate SU-8 in two different applications. First, we investigated the properties of a specially formulated SU-8 which can be spun as thin as /spl sim/100 nm. This is much thinner than normal formulations but necessary for high-resolution lithography. We then exposed an array of single pixel lines with a pitch of 200 nm. At a dose of 30 pC/cm we obtained a line width of /spl sim/60 nm. Second, using standard formulations of SU-8, we discovered that films as thick as 8 microns can be exposed with a 30 kV electron beam, the maximum of our system. Using the contrast curve as a calibration reference, we were able to make analog three-dimensional structures by spatially varying the dose as the feature is being written. With this technique we fabricated a 3/spl times/3 array of f/9 spherical lenses.
Sponsorship	IEEE Electron Devices Soc. Micron Found. IEEE EDS Boise Chapter Boise State Univ
Starting Page	57
Ending Page	60
File Size	195451
Page Count	4
File Format	PDF
ISBN	0780379721
ISSN	07496877
DOI	10.1109/UGIM.2003.1225696
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2003-07-02
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Electron beams Lithography Resists Epoxy resins Solvents Micromechanical devices Chemicals Robustness Calibration Lenses
Content Type	Text
Resource Type	Article

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4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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