NDLI: Development of dynamic mask photolithography system

Content Provider	IEEE Xplore Digital Library
Author	Yih-Lin Cheng Meng-Long Li Jiang-Hong Lin Jia-Hung Lai Chang-Tai Ke Yu-Chia Huang
Copyright Year	2005
Description	Author affiliation: Dept. of Mech. Eng., Nat. Taiwan Univ. of Sci. & Technlogy, Taipei, Taiwan (Yih-Lin Cheng; Meng-Long Li; Jiang-Hong Lin; Jia-Hung Lai; Chang-Tai Ke; Yu-Chia Huang)
Abstract	Masks have played an important role in the lithography process, but it takes time and money to make a quartz mask. In rapid prototyping (RP) technologies, curing of photopolymers is mainly achieved by laser scanning with limited fabrication speed. In this project, the dynamic mask technology is implemented to develop a dynamic mask photolithography system which requires no expensive quartz mask and is expected to fabricate parts faster than laser scanning. Digital micro-mirror device (DMD) from digital light processing (DLP) technology by Texas Instruments is used as a dynamic mask generator. Instead of using visible light in DLP, UV light source is utilized, hence, more photopolymers can be used in this system.
Sponsorship	IEEE Ind. Electron. Soc. (IES) Chinese Inst. of Autom. Eng. (CIAE) Nat. Sci. Council, Taiwan, R.O.C. Minist. of Educ., Taiwan, R.O.C
Starting Page	467
Ending Page	471
File Size	962174
Page Count	5
File Format	PDF
ISBN	0780389980
DOI	10.1109/ICMECH.2005.1529302
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-07-10
Publisher Place	Taiwan
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Lithography Curing Instruments Light sources Laser sintering Switches Mechanical engineering Laser theory Optical device fabrication Prototypes
Content Type	Text
Resource Type	Article

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