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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Yih, C.-M. Lee, G.-H. Chung, S.S. |
| Copyright Year | 1995 |
| Description | Author affiliation: Dept. of Electron. Eng., Nat. Chiao Tung Univ., Hsinchu, Taiwan (Yih, C.-M.; Lee, G.-H.; Chung, S.S.) |
| Abstract | Accurate modeling of the hot electron induced gate and substrate currents is of considerable importance for submicron MOS devices. In this paper, a new approach based on the simplified two-dimensional energy balance equations by incorporating the effect of transversal electric field and energy-dependent saturation velocity and relaxation time is presented. Substrate current characteristics can be predicted from the calculated energy dependent impact ionization rate. A consistent gate current is also obtained by using the same set of parameter values. Results of the gate and substrate currents present very good agreement with the experiment for a wide range of biases and channel lengths. Moreover, the conventional drift-diffusion approach tends to overestimate the calculated substrate current, while the new approach has solved the problem without difficulty. |
| Starting Page | 127 |
| Ending Page | 130 |
| File Size | 301396 |
| Page Count | 4 |
| File Format | |
| ISBN | 078032773X |
| DOI | 10.1109/VTSA.1995.524647 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1995-05-31 |
| Publisher Place | Taiwan |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | MOSFET circuits Poisson equations Impact ionization Electron mobility Power engineering and energy MOS devices Predictive models Very large scale integration Circuit optimization Numerical simulation |
| Content Type | Text |
| Resource Type | Article |
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