NDLI: A CMOS Compatible Traction Stress Sensing Element For Use In High Resolution Tactile Imaging

Content Provider	IEEE Xplore Digital Library
Author	Kane, B.J. Kovacs, G.T.A.
Copyright Year	1995
Description	Author affiliation: Stanford University (Kane, B.J.)
Abstract	A microstructure capable of resolving the three independent components of a point traction stress has been developed. The sensor exhibits an independent, linear response to each of the three components of an applied traction stress with measurement sensitivities of 130 mV/(VkPa) in the normal stress mode and 26 mV/(VkPa) in the two shear stress modes. The sensor was realized using a fabrication process which is fully CMOS compatible to allow for the future integration of local processing and control circuitry. High spatial resolution robotic tactile sensing may be possible with the sensor structure as each element is less than 300 x 300 /spl mu/m in size. A description of the sensor structure and the required signal processing follows, with mechanical characterization data included.
Starting Page	648
Ending Page	651
File Size	931896
Page Count	4
File Format	PDF
ISBN	9163034735
DOI	10.1109/SENSOR.1995.717313
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1995-06-25
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	CMOS image sensors Stress Image resolution High-resolution imaging Bridge circuits Robot sensing systems Capacitive sensors Mechanical sensors Tactile sensors Microstructure
Content Type	Text
Resource Type	Article

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