NDLI: Analysis of low metallic contamination on silicon wafer surfaces by VPT-TXRF - quantification of 10/sup 9/ atoms/cm/sup 2/ level contamination

Content Provider	IEEE Xplore Digital Library
Author	Shimazaki, A. Ito, S. Miyazaki, K. Matsumura, T.
Copyright Year	2005
Description	Author affiliation: Toshiba Corp., Yokohama, Japan (Shimazaki, A.; Ito, S.; Miyazaki, K.; Matsumura, T.)
Abstract	Total reflection X-ray fluorescence (TXRF) spectroscopy is well known as on-line monitoring system for ULSI manufacturing line, but it is not useful for quantifying less than 10/sup 10/ atoms/cm/sup 2/ metallic contamination because of its insufficient sensitivity. We developed a practical method named "VPT-TXRF" using vapor phase treatment (VPT) for quantifying metallic contaminants as low as 10/sup 9/ atoms/cm/sup 2/ on silicon wafer surface with TXRF system. One important aspect of this method is that high sensitivity was achieved within a practical measuring time of 500 seconds while maintaining the original surface conditions of the wafers. We are convinced that this method will become the most useful monitoring method for critical process contamination of the coming ULSI manufacturing line.
Sponsorship	IEEE Electron Devices Soc. IEEE Components Packaging and Manuf. Technol. Soc., Semicond. Equip. & Mater. Int. (SEMI) Soc. of Appl. Phys. of Japan
Starting Page	456
Ending Page	459
File Size	743922
Page Count	4
File Format	PDF
ISBN	0780391438
DOI	10.1109/ISSM.2005.1513404
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2005-09-13
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Silicon Surface contamination Ultra large scale integration Reflection Fluorescence Spectroscopy Monitoring Manufacturing Atomic measurements Surface treatment
Content Type	Text
Resource Type	Article

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
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3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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