NDLI: Computational lithography for nanostructure science and technology

Content Provider	IEEE Xplore Digital Library
Author	Peckerar, M. Sander, D. Srivastava, A. Foli, A.
Copyright Year	2007
Description	Author affiliation: Maryland Univ., College Park (Peckerar, M.; Sander, D.; Srivastava, A.; Foli, A.)
Abstract	There are two paths to nanostructure patterning. Self-assembly is intriguing, as it makes use of the natural tendency of materials to spontaneously coalesce into shapes of technological importance without relying on complex, expensive tools to do the job. But the number of achievable shapes and workable materials is limited, placing severe restrictions on the types of nanostructures that can be achieved. More-or-less conventional deep ultraviolet (DUV) optical printing techniques have performed astonishingly well for features sizes below 90 nm. Electron beam technology has printed arbitrary patterns with minimum feature sizes on the order of 10's of nanometers. These techniques do not suffer from the same restrictions on form and materials as self- assembly. There are restrictions, though. We address one of these here: the degree to which patterns can be faithfully reproduced as feature sizes scale to smaller dimensions.
Starting Page	1
Ending Page	2
File Size	165607
Page Count	2
File Format	PDF
ISBN	9781424418916
DOI	10.1109/ISDRS.2007.4422417
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2007-12-12
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Lithography Optical materials Nanostructured materials Shape Materials science and technology Self-assembly Electron optics Printing Electron beams Assembly
Content Type	Text
Resource Type	Article

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