NDLI: A computational study of gas phase chemistry in carbon nanotube synthesis by PECVD

Content Provider	IEEE Xplore Digital Library
Author	Garg, R.K. Gore, J.P. Fisher, T.S. Hash, D. Meyyappan, M.
Copyright Year	2003
Description	Author affiliation: Sch. of Mech. Eng., Purdue Univ., West Lafayette, IN, USA (Garg, R.K.; Gore, J.P.; Fisher, T.S.)
Abstract	In the present work, gas-phase reactions for different methane-hydrogen mixtures (CH/sub 4/+H/sub 2/) under different process parameters - input power from an external source, inlet composition of mixture, gas inlet temperature and substrate temperature - have been simulated in a plasma-enhanced chemical vapor deposition (PECVD) reactor. The goal of the simulations is to estimate the concentrations of species responsible for the formation of carbon nanotubes (CNTs). These estimates are expected to aid in understanding fundamental mechanisms of CNT formation and in controlling the synthesis process through controllable parameters. The results indicate that significant conversion of methane to acetylene and hydrocarbon radicals occurs for the PECVD pressures and plasma powers investigated.
Sponsorship	IEEE Nanotechnol. Council IEEE Region 6 Western USA
Starting Page	107
Ending Page	110
File Size	460644
Page Count	4
File Format	PDF
ISBN	0780379764
DOI	10.1109/NANO.2003.1231726
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2003-08-12
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Carbon nanotubes Plasma temperature Chemical vapor deposition Plasma chemistry Inductors Plasma simulation Chemical lasers Spontaneous emission Process control Chemical sensors
Content Type	Text
Resource Type	Article

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4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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