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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Zhang, Guixi Wang, Shumin Zhang, Qing |
| Copyright Year | 2010 |
| Description | Author affiliation: Gas Discharge and Plasma Laboratory, Dept. of Electrical Engineering, Tsinghua University, Beijing 100084, China (Zhang, Guixi; Wang, Shumin; Zhang, Qing) |
| Abstract | Argon plasma is generated with a microwave plasma $equipment^{1}$ at 2000 Pa and 500 Pa. We use Mach-Zehnder Interferometry to measure the electron density distribution of the plasma; and use a spectrometer to survey the electron temperature and other components of plasma. From the spectrum we find a considerable constitution of free oxygenic radicals such as free OH radicals, free NO radicals and so on. From Boltzmann fitting curve we calculate that the electron temperature of the argon plasma is about 0.7eV at 2000Pa and about 3.5eV at 500Pa when microwave power is 7kW, and figure out curve of the electron temperature changing with the power supplied at 500Pa. With the Mach-Zehnder interferometry we get the interferograms and work out that the electron density distribution is roughly uniform in the whole plasma as the power ranges from 3kW to 7kW |
| Starting Page | 1 |
| Ending Page | 1 |
| File Size | 166199 |
| Page Count | 1 |
| File Format | |
| ISBN | 9781424454747 |
| ISSN | 07309244 |
| e-ISBN | 9781424454761 |
| e-ISBN | 9781424454754 |
| DOI | 10.1109/PLASMA.2010.5533978 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2010-06-20 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Microwave measurements Temperature measurement Plasma temperature Argon Atmospheric measurements Density measurement |
| Content Type | Text |
| Resource Type | Article |
| Subject | Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering |
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