NDLI: Numerical simulation of sputtering via the feature profile simulator

Content Provider	IEEE Xplore Digital Library
Author	Moroz, P.
Copyright Year	2010
Description	Author affiliation: TEL US Holdings, Inc., Billerica, MA01821, USA (Moroz, P.)
Abstract	Numerical simulation of etching/deposition profiles is an important factor for semiconductor industry, as it allows analysis and prediction of the outcome of materials processing on a micron and sub-micron scale. A feature profile simulator has to be able to treat various chemical/physical processes taking place at or near the surfaces, which definitely include sputtering. Physical/chemical sputtering is a complex process, depending not only on the species and materials involved (incident ions and target materials) but also, for example, on energies of striking ions and their angles of incidence. There is significant experimental database as well as numerous theoretical and empirical considerations for sputtering of elemental targets. However, most of that was specifically applicable to high ion energies, usually significantly higher than the typical ion energy during the plasma materials processing. Numerical simulation tools such for example, as the Monte Carlo codes, MARLOWE and TRIM, were developed, but again, for the higher energy ions. In this report, we present analysis and simulation of sputtering for most of the elemental targets and various incident ions, carried out with the feature profile code FPS-3D [1-2]. The FPS-3D code allows general distribution of particle fluxes on energy and angle. However, for the present studies, the flux of ions was set as a beam at particular energy and angle. That allowed us to compare simulation results more directly with available experimental data and literature. The FPS-3D simulator uses input, chemistry, and flux files to specify all the simulation parameters, and does not require recompilation for different species, energies or angles. We are thankful to HFS [3] for providing us with the RANGE code, capable of calculating penetration depth of ions and their sputter yields, and with the advanced graphics package utilized in the FPS-3D code for viewing of evolving profiles during the simulation runs.
Starting Page	1
Ending Page	1
File Size	103175
Page Count	1
File Format	PDF
ISBN	9781424454747
ISSN	07309244
e-ISBN	9781424454761
e-ISBN	9781424454754
DOI	10.1109/PLASMA.2010.5533964
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2010-06-20
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Numerical simulation Sputtering Chemical processes Sputter etching Electronics industry Materials processing Surface treatment Databases Chemical elements Plasma materials processing
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

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