NDLI: A laser produced plasma sustained by a radiofrequency source

Content Provider	IEEE Xplore Digital Library
Author	Kelly, K.L. Scharer, J.E. Ding, G. Paller, E. Cao, R.
Copyright Year	2000
Description	Author affiliation: Dept. of Electr. & Comput. Eng., Wisconsin Univ., Madison, WI, USA (Kelly, K.L.)
Abstract	Summary form only given. The creation of a high-density plasma in a high pressure environment is studied. The plasma is generated by photoionization of the organic seed molecule tetrakis(dimethylamino)ethylene (TMAE) and is sustained by RF coupling through the use of an antenna. The coupled power is a function of antenna configuration, plasma density, working gas and applied magnetic field. Previous studies have utilized these antennas to couple power to the plasma through the inductive mode of operation. The inductive source operates by coupling power to the plasma through collisional ohmic heating of the wave energy. Helicon antennas have been shown to be very efficient sources in the low pressure argon regime with densities of the order of 4/spl times/10/sup 12/ cm/sup -3/ with only 600 W of power in a 5 cm radius tube. The VUV laser in this experiment has created plasmas of order 10/sup 14/ cm/sup -3/. The high density gives a high condition which allows higher radiation resistance of the antenna and more power to couple the plasmas. The use of different working gasses is explored and the results are compared and interpreted. The computer codes, ANTENNA2 and MAXEB are used to optimize the experiment and interpret results. The radiation resistance is measured using a network analyzer, and compared to code results. The plasma parameters are measured by Langmuir probes and optical emission spectra.
File Size	93844
File Format	PDF
ISBN	0780359828
ISSN	07309244
DOI	10.1109/PLASMA.2000.854719
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2000-06-04
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Plasma sources Radio frequency Plasma density Plasma measurements Plasma waves Antenna measurements Electrical resistance measurement Ionization Couplings Magnetic fields
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

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4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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