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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Nishida, M. Yukimura, K. Kambara, S. Maruyama, T. |
| Copyright Year | 2000 |
| Description | Author affiliation: Dept. of Electr. Eng., Doshisha Univ., Kyoto, Japan (Nishida, M.) |
| Abstract | Summary form only given, as follows. The NOx removal was made by using the NH/sub 3/ radicals which were prepared by dielectric barrier discharge with a one-cycle sinusoidal-wave power source. The discharge was intermittently made between coaxial cylindrical electrodes with a space of about 3 mm at an applied peak-to-peak voltage of 20-45 kV in ammonia gas. The radicals were introduced to a reaction chamber 10 cm in diameter and 40 cm in length, and were mixed with heated or unheated NOx gas. The spectrum of NH radical at 336 nm was observed at the mixing zone in the reaction chamber. The NOx reduction rate was measured at a source voltage between 20 to 45 kV. The rate changed in proportion with the applied source voltage between 20 and 45 kV. The electric power deposited into the dielectric barrier discharge increased with the applied voltage. The NOx reduction was also studied by using nitrogen plasma. The reduction ratio for nitrogen plasma hit the ceiling at higher applied source voltages. |
| File Size | 97753 |
| File Format | |
| ISBN | 0780359828 |
| ISSN | 07309244 |
| DOI | 10.1109/PLASMA.2000.854572 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2000-06-04 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Dielectrics |
| Content Type | Text |
| Resource Type | Article |
| Subject | Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering |
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