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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Weidman, D.J. Antoniades, J.A. Fernsler, R.F. Hubbard, R.F. Murphy, D.P. Myers, M.C. Santos, J. Meger, R.A. |
| Copyright Year | 1993 |
| Description | Author affiliation: Lab. for Plasma Res., Maryland Univ., MD, USA (Weidman, D.J.) |
| Abstract | Summary form only given. A fast framing camera (gated optical imager) is being used to measure the transverse offset of an electron beam during propagation through gas. The 5-MeV, 20-kA, 40-ns beam from SuperIBEX is injected into an IFR (ion-focused regime) cell to tailor the beam radius. Then the beam is passed through a B/sub /spl theta-cell, which is a drift tube with a current-carrying wire on axis, for centering. After this, the beam is injected into an air chamber in which the pressure is set to 760, 600, or 400 torr. In this chamber a thin sheet of quartz is placed in the beam path. The resulting Cherenkov radiation is viewed by the gated optical imager (GOI). The GOI provides three images of the beam profile during the beam pulse using a 2-ns "shutter" speed. The images are stored on a computer a provide a full two-dimensional image representing the beam current density cross-section. |
| File Size | 148022 |
| File Format | |
| ISBN | 0780313607 |
| ISSN | 07309244 |
| DOI | 10.1109/PLASMA.1993.593566 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1993-06-07 |
| Publisher Place | Canada |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Position measurement Electron beams Plasma measurements Optical propagation Probes Voltage Cameras Laboratories Electron optics Current density |
| Content Type | Text |
| Resource Type | Article |
| Subject | Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering |
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