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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Guoan Wang Hanyi Ding Bavisi, A. Kwanhim Lam Essam Mina |
| Copyright Year | 2007 |
| Description | Author affiliation: IBM Syst. & Technol. Group, Essex Junction, VT (Guoan Wang; Hanyi Ding; Bavisi, A.; Kwanhim Lam; Essam Mina) |
| Abstract | Although the discontinuity structures in the microstrip transmission lines such as a gap have been largely studied, the three-dimensional edge effects, skin effects and metal losses have hardly been analyzed in the model. In this paper, an accurate model which enable high predictability for electrical behavior of on-chip 3-D transmission line with gap discontinuity is developed from equations generated with conformal mapping techniques. The model has also been used to develope gap as a library device with schematic symbol, layout parameterized cell (PCell). T-line with gap has been implemented with back end of line (BEOL) in 0.13 mum SiGe BiCMOS technology. Good correlations have been achieved up to 120 GHz among EM simulation, measurement and model, less than 2.3deg phase difference and less than 1.59 dB coupling magnitude have been achieved for all the cases. The model is scalable and can be used for the design of mm-wave passive components as well as the guideline for high density interconnects layout. |
| Starting Page | 1 |
| Ending Page | 4 |
| File Size | 976835 |
| Page Count | 4 |
| File Format | |
| ISBN | 9781424407484 |
| DOI | 10.1109/APMC.2007.4554949 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2007-12-11 |
| Publisher Place | Thailand |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Millimeter wave technology BiCMOS integrated circuits Transmission line discontinuities Transmission lines Microstrip Skin effect Propagation losses Predictive models Equations Conformal mapping Equation based BiCMOS technology Silicon-Germanium Distributed passives T-line discontinuity/Interconnect Scalable model Technology independent |
| Content Type | Text |
| Resource Type | Article |
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