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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Yabuhara, Y. Kawarabayashi, S. Toyoda, N. Yokogawa, M. Fujita, K. Yamada, M. |
| Copyright Year | 1993 |
| Description | Author affiliation: Sumitomo Electr. Ind. Ltd., Itami, Hyogo, Japan (Yabuhara, Y.; Kawarabayashi, S.; Toyoda, N.; Yokogawa, M.; Fujita, K.) |
| Abstract | Two-inch diameter 220 mm-long the semi-insulating InP single crystals with low dislocation density have been successfully developed by the VCZ (vapor pressure controlled Czochralski) method. The length of the crystals is twice as long as conventional VCZ single crystals. These crystals have been grown by combining two key technologies. One is the VCZ method, which can reduce dislocation density by suppressing the phosphorus dissociation from the crystal surface caused by a low temperature gradient. The other is a multi-zone heater method, which can achieve the temperature profile suitable for the growth of long crystals. The etch pit density across the ingot was less than 4 /spl times/ 10/sup 3/ cm/sup 2/, one order of magnitude less than that of conventional liquid encapsulated Czochralski (LEC) crystals. The dispersion of resistivity of long VCZ crystals was better than that of conventional LEC crystals. The dispersion of resistivity of long VCZ crystals was better than that of conventional LEC crystals. The residual strain of long VCZ crystals was much lower than that of conventional LEC crystals. The residual strain of long VCZ crystals was much lower than that of conventional LEC crystals. The density of hillock on the epitaxial layer could be reduced by using this long VCZ crystal as the substrate. |
| Starting Page | 309 |
| Ending Page | 312 |
| File Size | 534308 |
| Page Count | 4 |
| File Format | |
| ISBN | 0780309936 |
| DOI | 10.1109/ICIPRM.1993.380648 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1993-04-19 |
| Publisher Place | France |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Indium phosphide Crystals Substrates Semiconductor device measurement Temperature Atomic measurements Strain measurement Pressure control Etching Crystallization |
| Content Type | Text |
| Resource Type | Article |
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