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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Wei-Zhi He Heng-Kuang Lin Pei-Chin Chiu Jen-Inn Chyi Chih-Hsin Ko Ta-Ming Kuan Meng-Kuei Hsieh Wen-Chin Lee Wann, C.H. |
| Copyright Year | 2010 |
| Description | Author affiliation: Exploratory Research Division, Taiwan Semiconductor Manufacture Company, No. 8, Li-Hsin Rd. 6, Hsinchu City 30077, Taiwan, R. O. C. (Chih-Hsin Ko; Ta-Ming Kuan; Meng-Kuei Hsieh; Wen-Chin Lee; Wann, C.H.) || Department of Electrical Engineering, National Central University, No. 300, Jhongda Rd., Chungli City, Taoyuan County 32001, Taiwan, R.O.C. (Wei-Zhi He; Heng-Kuang Lin; Pei-Chin Chiu; Jen-Inn Chyi) |
| Abstract | In this work, $N^{+}-InGaAs/InAlAs$ recessed gates for InAs/AlSb HFET development are presented. Highly doped $N^{+}-InGaAs$ cap layers are used to decrease the parasitic resistances in contact and access regions. As-grown modulation-doped epitaxy materials exhibit a Hall mobility of 14,200 $cm^{2}/V$ s and a sheet density of 6.15 $×10^{12}$ $cm^{−2},$ while a mobility of 14,600 $cm^{2}/V$ s and a sheet density of $5.61×10^{12}$ $cm^{−2}$ are shown after removal of the $N^{+}-InGaAs$ cap. Benefiting the energy band lowering using the highly doped cap layers, a low contact resistance of 0.06 Ω-mm is achieved. DC performances of IDSS=862mA/mm and gm, peak=927mS/mm and RF performances of fT=24GHz and fmax=51GHz are demonstrated in a 2.1μm-gate-length device. An fT-Lg product is as high as 51 GH-μm. |
| Starting Page | 1 |
| Ending Page | 4 |
| File Size | 878257 |
| Page Count | 4 |
| File Format | |
| ISBN | 9781424459193 |
| ISSN | 10928669 |
| e-ISBN | 9781424459223 |
| DOI | 10.1109/ICIPRM.2010.5516406 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2010-05-31 |
| Publisher Place | Japan |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Indium compounds HEMTs MODFETs Epitaxial layers Epitaxial growth Sheet materials Hall effect Contact resistance Decision support systems Radio frequency HFET InAs recessed gate |
| Content Type | Text |
| Resource Type | Article |
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