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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Heon Lee Sunghoon Hong Giyeon Yang |
| Copyright Year | 2005 |
| Description | Author affiliation: Dept. of Mater. Sci. & Eng., Korea Univ., Seoul, South Korea (Heon Lee; Sunghoon Hong; Giyeon Yang) |
| Abstract | Three different kinds of imprinting lithography techniques UV curing imprinting, thermally curing imprinting with monomer resin, and hot embossing imprinting with polymer resin were used to transfer as small as 70 nm in patterns of template onto the various substrates including Si wafer, oxidized Si wafer, quartz wafer, glass plate, PET (polyethylene terephthalate) film, ITO (indium tin oxide) coated PET, and Al foil. High fidelity pattern transferring was observed in all cases. It is shown that nano-imprinting lithography is one of the most promising techniques to fabricate nanosize patterns on various substrates. |
| Starting Page | 237 |
| Ending Page | 240 |
| File Size | 2882970 |
| Page Count | 4 |
| File Format | |
| ISBN | 0780387112 |
| DOI | 10.1109/MMB.2005.1548437 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2005-05-12 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Fabrication Lithography Substrates Curing Resins Polymer films Positron emission tomography Indium tin oxide Embossing Glass Polyethylene Terephthalate Hot embossing Nano-imprinting lithography Nano-patterned substrate Resin Template UV curing Nano-imprinting lithography Polymethylmethacrylate |
| Content Type | Text |
| Resource Type | Article |
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