NDLI: Role of the substrate and the temperature of deposition on the properties of the TaxN thin films

Content Provider	IEEE Xplore Digital Library
Author	Ocko, M. Aonja, S. Ivanda, M.
Copyright Year	2012
Description	Author affiliation: Institute of Physics, Bijenička cesta 46, HR-10000 Zagreb, Croatia (Ocko, M.) \|\| Faculty of Electrical Engineering and Computing, University of Zagreb, Unska 3, HR-10000, Croatia (Aonja, S.) \|\| Ruder Bošković Institute, Bijenička cesta 54, HR-10000 Zagreb, Croatia (Ivanda, M.)
Abstract	We present an interim report on the investigations of the TaxN thin films deposited on the (100) Si wafers coated with a 140-nm thermal SiO2 layer. Our conclusions are based on the room temperature sheet resistance measurements, transport properties measurements from helium up to room temperature and on the Raman spectra analysis of the investigated series. In particular, we discuss a nonmonotonous concentration dependence of transport properties. This behaviour we attribute to a local minimum in the density of electronic states at the Fermi level calculated for the intermetallic Ta4N5 [1]. Such behaviour was not observed in other investigations on the transport properties of TaxN found in literature. Also our Raman spectra show some differences compared to other Raman investigations on TaxN. We ascribe these and other differences discussed to the substrate properties which were used in the preparation of these thin films. The overall properties of the TaxN deposited on the oxidized Si wafers are compared to the properties of the TaxN thin films deposited on sapphire.
Starting Page	17
Ending Page	18
File Size	966877
Page Count	2
File Format	PDF
ISBN	9781467325776
e-ISBN	9789532330687
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-05-21
Publisher Place	Croatia
Access Restriction	Subscribed
Rights Holder	MIPRO
Subject Keyword	Temperature measurement Temperature dependence Temperature Conductivity Silicon Acoustics Substrates
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
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