NDLI: Amorphous silicon waveguides grown by PECVD on an Indium Tin Oxide buried contact

Content Provider	IEEE Xplore Digital Library
Author	Rao, S. Della Corte, F.G. Summonte, C.
Copyright Year	2010
Description	Author affiliation: Institute for Microelectronics and Microsystems, Consiglio Nazionale delle Ricerche - Unit of Bologna, Via Gobetti 101, 40129, Italy (Summonte, C.) \|\| Department of Information Science, Mathematics, Electronics and Transportations (DIMET), ¿Mediterranea¿ University, Via Graziella Località Feo di Vito, Reggio Calabria, 89131, Italy (Rao, S.; Della Corte, F.G.)
Abstract	Low-loss hydrogenated amorphous silicon (α-Si∶H) waveguides were realized by plasma enhanced chemical vapour deposition (PECVD) on a transparent conductive oxide (TCO) layer which is intended to provide the buried contact in active devices, e.g switches and modulators. In particular we propose a technological solution to overcome both the strong reduction in optical transmittance due to the very high extinction coefficient of metal contacts and, at the same time, the optical scattering induced by the texturization effect induced on α-Si∶H films grown on TCO. The realized waveguides were characterized in terms of propagation losses at 1550nm and surface roughness. The experimental performances have been compared to those obtained through calculations using an optical simulation package. The results are found to be in agreement with the experimental data.
Starting Page	1465
Ending Page	1469
File Size	292435
Page Count	5
File Format	PDF
ISBN	9781424457939
e-ISBN	9781424457953
DOI	10.1109/MELCON.2010.5476232
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2010-04-26
Publisher Place	Malta
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Amorphous silicon Indium tin oxide Optical waveguides Optical films Optical scattering Plasma applications Plasma chemistry Plasma devices Plasma waves Chemicals
Content Type	Text
Resource Type	Article

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
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3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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