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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Zhihua Li Huajun Shen Chengyue Yang Baoxia Li Lixi Wan |
| Copyright Year | 2007 |
| Description | Author affiliation: Chinese Acad. of Sci., Beijing (Zhihua Li; Huajun Shen; Chengyue Yang; Baoxia Li; Lixi Wan) |
| Abstract | A new 850 nm edge-view-photodetector (EVPD) was designed, fabricated and measured. The EVPD is designed to simplify optical packagings in an optical interconnects system by eliminating the using of turning mirrors and microlenses. The PIN active area of the photodetector is fabricated on a sloping sidewall of mesa structures. The resulting photodetector becomes edge viewing while the electrical pads remain horizontal. The EVPD fabrication process and initial measurement results are presented in this letter. The main processing steps include deep anisotropic chemical etching, material growth on slope and lithography on 3-D micro structure. |
| Starting Page | 1 |
| Ending Page | 3 |
| File Size | 1285300 |
| Page Count | 3 |
| File Format | |
| ISBN | 9781424413911 |
| DOI | 10.1109/ICEPT.2007.4441491 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2007-08-14 |
| Publisher Place | China |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Packaging Optical interconnections Photodetectors Optical design Turning Mirrors Lenses Microoptics Optical device fabrication Anisotropic magnetoresistance 3-D microstructure EVPD optical packaging optical interconnect epitaxy |
| Content Type | Text |
| Resource Type | Article |
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