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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Senda, K. Fujii, E. Hiroshima, Y. Takamura, T. |
| Copyright Year | 1986 |
| Description | Author affiliation: Matsushita Electronics Corporation, Osaka, Japan (Senda, K.) |
| Abstract | An SOI image sensor where the read-out transistors are well isolated from the silicon substrate is proposed. The isolation results in remarkable reduction of the photo-leakage current to a value as low as 1/8000 times that in the conventional bulk transistors, implying the corresponding reduction of smear noise of the sensor. It is pointed out also that the parasitic capacitance of the vertical signal line in the SOI structure is reduced to a half value of that in the bulk structure. With the use of the large area seeding-region serving also as a photodiode region, a high-quality SOI film has been obtained by the laser recrystallization. The structure of the SOI image sensor is the hybrid integration of the SOI transistors and the bulk transistors. As a result, the video output signal of 50 pixels has been successfully obtained. |
| Starting Page | 369 |
| Ending Page | 372 |
| File Size | 434587 |
| Page Count | 4 |
| File Format | |
| DOI | 10.1109/IEDM.1986.191194 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1986-12-07 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Image sensors Substrates Photodiodes Silicon on insulator technology Semiconductor device noise Photoconductivity Optical noise Epitaxial growth Sensor phenomena and characterization Circuits |
| Content Type | Text |
| Resource Type | Article |
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