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Content Provider | IEEE Xplore Digital Library |
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Author | Pil Sung Park Rajan, S. |
Copyright Year | 1963 |
Abstract | We have carried out 2-D simulation of N-polar and Ga-polar AlGaN/GaN HEMTs to investigate short-channel effects in highly scaled devices. N-polar HEMTs were found to have better drain-induced barrier lowering (DIBL) suppression than Ga-polar HEMTs. The short-channel effects were found to originate from the 2-D potential distribution in the channel and space-charge-limited current through the buffer. The inverted structure of the N-polar HEMT was found to provide better suppression of short-channel effects under idealized theoretical assumptions that were used in the model presented. |
Sponsorship | IEEE Electron Devices Society |
Starting Page | 704 |
Ending Page | 708 |
Page Count | 5 |
File Size | 810234 |
File Format | |
ISSN | 00189383 |
Volume Number | 58 |
Issue Number | 3 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2011-03-01 |
Publisher Place | U.S.A. |
Access Restriction | One Nation One Subscription (ONOS) |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | HEMTs MODFETs Gallium nitride Logic gates Aluminum gallium nitride Threshold voltage technology computer-aided design (TCAD) AlGaN/GaN high electron mobility transistor (HEMT) drain-induced barrier lowering (DIBL) Ga-polar N-polar short-channel effects simulation |
Content Type | Text |
Resource Type | Article |
Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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