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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Colinge, J.-P. |
| Copyright Year | 1963 |
| Abstract | A model developed to explain conduction mechanisms in thin-film accumulation-mode SOI p-channel MOSFETs is discussed. It is found that, unlike that which occurs in thin-film fully depleted n-channel devices, there is little or no coupling between the front and back gates, unless the surface-state density is so high that the film remains depleted even when an accumulation channel is formed. The apparent front threshold shift is explained by back-gate modulation of a body current, flowing from the source to the drain. Indeed, the body of the device presents a p/sup +/-p/sup -/-p/sup +/ structure whose conductivity is controlled by the depth of the depletion zones arising from the top and the bottom of the silicon film. The model is used to calculate drain current as a function of front- and back-gate bias as well as output characteristics.< |
| Sponsorship | IEEE Electron Devices Society |
| Starting Page | 718 |
| Ending Page | 723 |
| Page Count | 6 |
| File Size | 490054 |
| File Format | |
| ISSN | 00189383 |
| Volume Number | 37 |
| Issue Number | 3 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1990-03-01 |
| Publisher Place | U.S.A. |
| Access Restriction | One Nation One Subscription (ONOS) |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | MOSFETs Thin film transistors Silicon Semiconductor films Conductive films Threshold voltage Thin film devices Conductivity Doping Surface treatment |
| Content Type | Text |
| Resource Type | Article |
| Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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