NDLI: Fabrication of high-aspect-ratio polymer nanochannels using a novel Si nanoimprint mold and solvent-assisted sealing

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Microfluidics and Nanofluidics : Volume 9, Issue 1, July 2010

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Fabrication of high-aspect-ratio polymer nanochannels using a novel Si nanoimprint mold and solvent-assisted sealing

Content Provider	Springer Nature Link
Author	Cho, Y. H. Park, J. Park, H. Cheng, X. Kim, B. J. Han, A.
Copyright Year	2009
Abstract	We present a low cost nanofabrication method to fabricate high-aspect-ratio (HAR) polymer nanochannels using a novel silicon nanoimprint mold fabrication technique and a solvent-assisted sealing method. These nanofluidic channels are being developed for single biomolecule detection. The silicon nanoimprint mold fabrication process is based on the combination of anisotropic etching of silicon by potassium hydroxide (KOH) solution and the local oxidation of silicon (LOCOS) process. The resulting high-aspect-ratio silicon mold has smooth sidewalls owing to the anisotropic KOH etching process along the silicon crystalline geometry as well as the LOCOS process. The nanostructures in the nanoimprint molds that form the nanochannels can be easily controlled by the initial micropattern sizes defined using conventional UV lithography and the oxidation time, making this technique a practical solution for low cost and high-throughput HAR silicon nanoimprint mold fabrication. Nanoimprint molds having aspect ratios of more than 1:5.5 (width: 200 nm, height: 1.1 μm, length: 1 cm) were successfully fabricated. Nanoimprinting technique was used to create poly(methyl methacrylate) (PMMA) nanotrenches out of this nanoimprint mold. A novel solvent-assisted sealing technique was developed in order to seal the HAR PMMA nanotrenches. This technique enables the generation of nanochannels with various nanoscale dimensions without the need for complicated and expensive nanolithography tools.
Starting Page	163
Ending Page	170
Page Count	8
File Format	PDF
ISSN	16134982
Journal	Microfluidics and Nanofluidics
Volume Number	9
Issue Number	2-3
e-ISSN	16134990
Language	English
Publisher	Springer-Verlag
Publisher Date	2009-11-19
Publisher Place	Berlin, Heidelberg
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Nanochannel fabrication Nanoimprint lithography High-aspect-ratio nanostructure Biomedical Engineering Engineering Fluid Dynamics
Content Type	Text
Resource Type	Article
Subject	Nanoscience and Nanotechnology Materials Chemistry Condensed Matter Physics Electronic, Optical and Magnetic Materials

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