Wafer-scale fabrication of high-aspect ratio nanochannels based on edge-lithography technique.

Content Provider	Europe PMC
Author	Xie, Quan Zhou, Qing Xie, Fei Sang, Jianming Wang, Wei Zhang, Haixia Alice Wu, Wengang Li, Zhihong
Copyright Year	2012
Abstract	This paper introduced a wafer-scale fabrication approach for the preparation of nanochannels with high-aspect ratio (the ratio of the channel depth to its width). Edge lithography was used to pattern nanogaps in an aluminum film, which was functioned as deep reactive ion etching mask thereafter to form the nanochannel. Nanochannels with aspect ratio up to 172 and width down to 44 nm were successfully fabricated on a 4-inch Si wafer with width nonuniformity less than 13.6%. A microfluidic chip integrated with nanometer-sized filters was successfully fabricated by utilizing the present method for geometric-controllable nanoparticle packing.
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ISSN	19321058
Volume Number	6
DOI	10.1063/1.3683164
PubMed Central reference number	PMC3293387
Issue Number	1
PubMed reference number	22396721
Journal	Biomicrofluidics
e-ISSN	19321058
Language	English
Publisher	American Institute of Physics
Publisher Date	2012-02-09
Access Restriction	Open
Rights License	Copyright © 2012 American Institute of Physics
Content Type	Text
Resource Type	Article
Subject	Genetics Nanoscience and Nanotechnology Fluid Flow and Transfer Processes Colloid and Surface Chemistry Molecular Biology Physical and Theoretical Chemistry Condensed Matter Physics Materials Science Biomedical Engineering