NDLI: Optical Nanolithography

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Optical Nanolithography

Content Provider	Scilit
Author	Smith, Bruce W.
Copyright Year	2020
Description	Optical lithography42 involves the creation of relief image patterns through the projection of radiation within or near the ultraviolet (UV) visible portion of the electromagnetic spectrum. Techniques of optical lithography, or photolithography, have been used to create patterns for engravings, photographs, and printing plates. In the 1960s, techniques developed for the production of lithographic printing plates were utilized in the making of microcircuit patterns for semiconductor devices. These early techniques of contact or proximity photolithography were refined to allow circuit resolution on the order of 3–5 micrometer (μm). Problems encountered with proximity lithography, such as mask and wafer damage, alignment difficulty, and field size, have limited its application for most photolithographic needs. In the mid-1970s, projection techniques minimized some of the problems encountered with proximity lithography and have led to the development of tools that currently allow resolution below 45 nm. Book Name: Microlithography
Related Links	https://content.taylorfrancis.com/books/download?dac=C2011-0-03868-5&isbn=9781315117171&doi=10.1201/9781315117171-2&format=pdf
DOI	10.1201/9781315117171-2
Language	English
Publisher	Informa UK Limited
Publisher Date	2020-05-01
Access Restriction	Open
Subject Keyword	Book Name: Microlithography Proximity Lithography Problems Encountered Printing Plates Create Photolithography
Content Type	Text
Resource Type	Chapter

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