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Maskless Lithography
| Content Provider | Scilit |
|---|---|
| Author | Suzuki, Kazuaki |
| Copyright Year | 2020 |
| Description | “Maskless” means “Direct Write.” A556 maskless lithography tool has a pattern generator, which creates an exposure beam control converted from a designed pattern data format (such as GDS II) but does not use a mask. There are three kinds of exposure beam: electron beam (e-beam), ion beam, and optical laser beam. Book Name: Microlithography |
| Related Links | https://content.taylorfrancis.com/books/download?dac=C2011-0-03868-5&isbn=9781315117171&doi=10.1201/9781315117171-10&format=pdf |
| Ending Page | 594 |
| Page Count | 40 |
| Starting Page | 555 |
| DOI | 10.1201/9781315117171-10 |
| Language | English |
| Publisher | Informa UK Limited |
| Publisher Date | 2020-05-01 |
| Access Restriction | Open |
| Subject Keyword | Book Name: Microlithography Manufacturing Engineering Optical Lithography Direct Write Converted Maskless |
| Content Type | Text |
| Resource Type | Chapter |