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Immersion lithography: Moving microlithography to nanolithography
| Content Provider | Semantic Scholar |
|---|---|
| Author | Taylor, James Christopher Chambers, Charles R. Shayib, Ramzy M. LeSuer, Robert J. Conley, Willard Earl Willson, C. Grant |
| Copyright Year | 2004 |
| Abstract | Microlithography has been the primary process for integrated circuit (IC) manufacturing over the past several decades. In this process, Figure 1, a silicon wafer is spin coated with a polymer based film known as a photoresist. Portions of the film are then exposed to UV radiation of a particular wavelength through a partially chrome-plated quartz mask. The chrome plating on the quartz outlines a 2-D circuit design. Small molecules in the resist film, photoacid generators (PAGs), undergo a reaction in the exposed regions to produce acid molecules. These acids are used to catalyze a solubility-switching reaction in the polymer during a post exposure bake. This renders the exposed areas soluble in an aqueous base solution which is used to remove the polymer in these regions and leave a positive tone image of the circuit design. Subsequent etch and strip steps are then used to transfer the pattern into the silicon and remove the remaining resist material. |
| Starting Page | 10669 |
| Ending Page | 10674 |
| Page Count | 6 |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://folk.ntnu.no/skoge/prost/proceedings/aiche-2004/pdffiles/papers/051e.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
