NDLI: Effective solvothermal deoxidization of graphene oxide using solid sulphur as a reducing agent

Content Provider	Royal Society of Chemistry (RSC)
Author	Lin, Liangxu Zhang, Shaowei
Copyright Year	2012
Abstract	Functional group free graphene materials with high electronic conductivities were prepared via solvothermal reaction of solid sulphur (S) and graphene oxide (GO) in a H2O–NMP or H2O–DMF (1 : 1 in volume ratio) solvent at 110 °C for 10 h. Ultraviolet-visible (UV/Vis) analysis revealed that S exhibited strong reductive ability in a boiling GO aqueous solution. Its reducing effect could be further enhanced by using NMP or DMF as a surfactant to adjust the solvent surface tension close to the surface energy of graphene. UV/Vis and X-ray photoelectron spectroscopy (XPS) results confirmed that the electronic structure of graphene had been completely restored and the oxygen contents reduced remarkably. No graphitic stacking between the reduced GO (RGO) was found. As-prepared RGO products also exhibited good dispersivities in various solvents. Moreover, it was inter-convertible between their different forms: agglomerates, simply air dried bulk solids and films and well-dispersed suspensions.
Starting Page	14385
Ending Page	14393
Page Count	9
File Format	HTM / HTML PDF
ISSN	09599428
Volume Number	22
Issue Number	29
Journal	Journal of Materials Chemistry
DOI	10.1039/c2jm31940c
Language	English
Publisher	Royal Society of Chemistry
Access Restriction	Open
Subject Keyword	NMP Functional group Graphene Sulfur Solvent Willem C. Vis Moot Surfactant Surface tension Surface energy X-ray photoelectron spectroscopy Photoemission spectroscopy Oxygen
Content Type	Text
Resource Type	Article
Subject	Chemistry Materials Chemistry

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