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| Content Provider | IET Digital Library |
|---|---|
| Author | Scherzer, Ryan D. Gasparov, Lev V. Stagon, Stephen P. |
| Abstract | Noble metal nanostructures serve as excellent substrates for the detection of trace amounts of substances in surface enhanced Raman spectroscopy, but they have not found widespread commercial use due to their instability and short shelf lives. This work demonstrates that silver nanoparticles grown onto substrates with nanoscale roughness, using glancing angle physical vapour deposition and subsequently thermally annealed at 500°C to generate a stable lower energy configuration, exhibit Raman enhancements that are strong and remain stable with no drop over 30 days. These nanoparticle arrays may serve as time stable substrates for commercial scale Raman spectroscopy or may be employed in harsh environments. |
| Starting Page | 498 |
| Ending Page | 501 |
| Page Count | 4 |
| Volume Number | 13 |
| e-ISSN | 17500443 |
| Issue Number | Issue 4, Apr (2018) |
| Alternate Webpage(s) | https://digital-library.theiet.org/content/journals/mnl/13/4 |
| Alternate Webpage(s) | https://digital-library.theiet.org/content/journals/10.1049/mnl.2017.0526 |
| Journal | Micro & Nano Letters |
| Publisher Date | 2018-04-01 |
| Access Restriction | Open |
| Rights Holder | © The Institution of Engineering and Technology |
| Subject Keyword | Annealing Processes Glancing Angle Physical Vapour Deposition Heat And Thermomechanical Treatments High Temperature Effect Infrared And Raman Spectra in Metals Ion Plating And Other Vapour Deposition Low-Dimensional Structure: Growth, Structure And Nonelectronic Property Morphological Stability Nanofabrication Nanoparticle Nanoparticle Array Nanoscale Roughness Nanotube And Nanostructured Material Optical Property of Metals And Metallic Alloy Raman Enhancements Raman Spectra Rough Substrates Rough SurFace Silver Compound Silver NanoParticle Solid Surface Structure Stable Lower Energy Configuration Structure of Solid Clusters Surface Modulator/Detector Array Surface Resistance Measurement Temperature 500 DegC Thermal Annealing |
| Content Type | Text |
| Resource Type | Article |
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