NDLI: Shaping the profile of photonic crystal nanorods

Content Provider	IEEE Xplore Digital Library
Author	Xiaoxiao Jiang Qiongchan Gu Jiangtao Lv Yanjun Liu Guangyuan Si Hongjun Duan Zhenhe Ma Fengwen Wang Jinghua Teng
Copyright Year	2012
Description	Author affiliation: Institute of Materials Research and Engineering, 3 Research Link, Singapore 117602 (Yanjun Liu; Jinghua Teng) \|\| School of Control Engineering, Northeastern University at Qinhuangdao, China 066004 (Xiaoxiao Jiang; Qiongchan Gu; Jiangtao Lv; Guangyuan Si; Hongjun Duan; Zhenhe Ma; Fengwen Wang)
Abstract	The focused ion beam technique is a frequently used method to manufacture photonic crystal structures due to its capability of defining patterns in a wide range of materials without using masks. One critical drawback of FIB milling technique is the non-vertical profile resulted from redeposition effects during lithography. Tapered sidewalls may impact the performance of the fabricated device significantly. In a previous work, we have shown it is possible to shape the profile of nanoholes by truncating the seriously tapered bottoms. Here, we report on the re-definition of nanorod photonic crystals using focused ion beam milling. The proposed method is simple and entirely monolithic.
Starting Page	1
Ending Page	4
File Size	897860
Page Count	4
File Format	PDF
ISBN	9781467325134
e-ISBN	9781467325165
DOI	10.1109/PGC.2012.6457919
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-12-13
Publisher Place	Singapore
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	nanorods Milling Materials tapered sidewalls focused ion beam milling
Content Type	Text
Resource Type	Article

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