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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Plociennik, P. Zawadzka, A. Lukasiak, Z. Brodzinska, K. Korcala, A. Bartkiewicz, K. |
| Copyright Year | 2013 |
| Description | Author affiliation: Inst. of Phys., Nicolaus Copernicus Univ., Torun, Poland (Plociennik, P.; Zawadzka, A.; Lukasiak, Z.; Brodzinska, K.; Korcala, A.; Bartkiewicz, K.) |
| Abstract | In this paper, we report the experimental investigation of optical properties of $HfO_{2}$ (hafnium oxide) thin films grown on quartz substrates by pulsed laser deposition (PLD) method [1]. Cold pressed powders of hafnium oxide $(HfO_{2}$ 98% - Aldrich Chem. Co.) were used as the target for deposition process. The transparent quartz substrate was heated up to temperature in the range between 200 and 600 °C. Optical properties of the films were investigated by transmittance in the ultra-violet, visible and near infrared range and photoluminescence spectroscopy. We measure the photo-luminescence spectra and dynamics of luminescence process [2]. The PL spectra contained one strong maximum at 385 nm and the peak intensity decreases rapidly with increasing temperature. Optical properties are closely related to the structure of the hafnium oxide thin films. |
| Starting Page | 1 |
| Ending Page | 3 |
| File Size | 1328764 |
| Page Count | 3 |
| File Format | |
| ISBN | 9781479906833 |
| ISSN | 21612064 |
| DOI | 10.1109/ICTON.2013.6602905 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2013-06-23 |
| Publisher Place | Spain |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Hafnium oxide Temperature measurement Photoluminescence Substrates Integrated optics Optical films photoluminescence PLD (Pulsed Laser Deposition) hafnium oxide transmission |
| Content Type | Text |
| Resource Type | Article |
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