NDLI: Monte Carlo simulation of X-ray diffraction embedded in experimental determination of residual stresses in microsystems

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Monte Carlo simulation of X-ray diffraction embedded in experimental determination of residual stresses in microsystems

Content Provider	IEEE Xplore Digital Library
Author	Zschenderlein, U. Wunderle, B.
Copyright Year	2011
Description	Author affiliation: Chemnitz University of Technology, Chair Materials and Reliability of Microsystems, Germany (Zschenderlein, U.; Wunderle, B.)
Abstract	In this paper a simulation is presented which tracks photons through complex material systems. Besides the usual Compton and Rayleigh scattering that is covered in high energy radiography simulations the presented model considers Bragg-Laue diffraction. The implementation bases on a Monte Carlo code to account for the scattering during radiography. In this paper first results of the simulation are presented. A simple radiation as well as a diffraction experiment was setup. The attenuation coefficient and the position of the diffraction peaks drawn out of the simulation were in good agreement with the literature.
File Size	2001250
File Format	PDF
ISBN	9781457701078
e-ISBN	9781457701061
DOI	10.1109/ESIME.2011.5765774
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2011-04-18
Publisher Place	Austria
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Photonics Scattering X-ray scattering Lead X-ray diffraction Crystals Simulation
Content Type	Text
Resource Type	Article

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