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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Veena, M.G. Renukappa, N.M. Shivakumar, K.N. Seetharamu, S. |
| Copyright Year | 2012 |
| Description | Author affiliation: Department of Electronics and Communication, Sri Jayachamarajendra College of Engineering, Mysore-570 006, India (Veena, M.G.; Renukappa, N.M.) || Materials Technology Division, Central Power Research Institute, Bengaluru-560080, India (Seetharamu, S.) || Center for Composite Materials Research, Department of Mechanical Engineering, NC A&T State University, Greensboro, North Carolina- 27411, USA (Shivakumar, K.N.) |
| Abstract | This paper focused on epoxy-based nanodielectric composites with 5, 10, 15 and 20 wt.% of silica constituents prepared using simple mechanical mixing technique along with required curing cycles. The experimentally clarified dielectric constant (ϕ′) and dissipation factor (tanδ) are influenced by addition of nanosilica is discussed on the basis of the three core interface model proposed for interaction zones. The interfacial region (interaction zone) is likely to be pivotal in controlling properties, the bonding and crosslinking between epoxy-silica was characterized using Fourier transform Infrared Spectroscopy (FTIR) and Differential Scanning Calorimetery (DSC). In addition, Positron Annihilation Lifetime Spectroscopy (PALS) is used to determine free volume of nanocomposites. |
| Starting Page | 1 |
| Ending Page | 4 |
| File Size | 682789 |
| Page Count | 4 |
| File Format | |
| ISBN | 9781467328524 |
| ISSN | 21609241 |
| e-ISBN | 9781467328517 |
| DOI | 10.1109/ICPADM.2012.6318951 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2012-07-24 |
| Publisher Place | India |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Dielectrics Materials Fabrication OWL Silicon compounds Positrons Degradation Glass transition temperature Dielectric constant tanδ Fourier Transform Infrared Spectroscopy Free volume |
| Content Type | Text |
| Resource Type | Article |
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