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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Saggio, M. Fagone, D. Musumeci, S. |
| Copyright Year | 2000 |
| Description | Author affiliation: R&D Dept., STMicroelectron., Catania, Italy (Saggio, M.) |
| Abstract | A new PowerMOSFET device, called MDmesh/sup TM/ (Multiple Drain mesh), that joins the best performance in the Power management market either in static and dynamic behavior is presented. A strong reduction in the silicon conduction losses per area allowed a valuable resize of the device area and a reduction of the used package volume. Moreover, a valuable reduction in device internal capacitance and gate charge has been observed and an optimized switching behavior has been obtained. A deep look inside the device performances will be presented and the main device features will be compared with the ones of a device having the same conduction losses fabricated with a standard technology. |
| Starting Page | 65 |
| Ending Page | 68 |
| File Size | 396216 |
| Page Count | 4 |
| File Format | |
| ISBN | 0780362691 |
| ISSN | 10636854 |
| DOI | 10.1109/ISPSD.2000.856774 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2000-05-22 |
| Publisher Place | France |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | MOSFETs Production Strips Silicon Doping Fingers Breakdown voltage Conductivity Frequency Switching loss |
| Content Type | Text |
| Resource Type | Article |
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